Abstract: Hydrogenated fullerene-like carbon (FL-C:H) films were deposited on Si(100) substrates by a direct current plasma enhanced chemical vapor deposition(dc-PECVD) technique using pure CH₄ as feedstock. Simplify the hydrogen fullerene (FL-C: H) films prepared by pulsed bias-assisted plasma chemical vapor process (mc-PECVD). The microstructures and the FL content of the FL-C:H films were characterized by high transmission electron microscopy and Raman spectrum. The mechanical properties and friction behaviors of the films were investigated by using a Nano-indenter and a ball-on-disk tester. Results show that compared with the hydrogen-containing fullerene-like films prepared by pulse bias-assisted method,FL-C:H films prepared by dc method that exhibited a similar microstructure,superior excellent mechanical properties and tribological performance,and these films showed low sensitivity to load,frequency and relative humidity.