Abstract: A review was given on the research progress in the surface modification and micro-tribological behavior of single crystal silicon. Thus the studies on the micro-mechanical and tribological properties of single crystal Si and the deposited films and oxide layers thereon, and that on the ion implantation and surface nanocrystallization of the single crystal Si were summarized and discussed. It was suggested to further the study on the surface modification techniques and the micro-nano-tribological behaviors of the modified layers, in particular, to promote the study on the ion implantation and surface nanocrystallization of the Si-based materials, so as to meet the need in the application and development of the high-tech areas such as MEMS and NEMS.