ISSN   1004-0595

CN  62-1095/O4

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离子注入对SiO2表面非晶碳薄膜的化学状态及摩擦学性能的影响[J]. 摩擦学学报, 2001, 21(1): 6-9.
引用本文: 离子注入对SiO2表面非晶碳薄膜的化学状态及摩擦学性能的影响[J]. 摩擦学学报, 2001, 21(1): 6-9.
Effect of Ion Implantation on the Interface Chemical States a nd Tribological Behavior of Amorphous Carbon Film on SiO2 Substrate[J]. TRIBOLOGY, 2001, 21(1): 6-9.
Citation: Effect of Ion Implantation on the Interface Chemical States a nd Tribological Behavior of Amorphous Carbon Film on SiO2 Substrate[J]. TRIBOLOGY, 2001, 21(1): 6-9.

离子注入对SiO2表面非晶碳薄膜的化学状态及摩擦学性能的影响

Effect of Ion Implantation on the Interface Chemical States a nd Tribological Behavior of Amorphous Carbon Film on SiO2 Substrate

  • 摘要: 采用真空蒸镀法在SiO

     

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