ISSN   1004-0595

CN  62-1095/O4

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雷红, 司马能, 屠锡富, 布乃敬, 严琼林, 吴鑫. 氧化硅/氧化铁复合磨粒用于硬盘基片的抛光研究[J]. 摩擦学学报, 2010, 30(3): 268-272.
引用本文: 雷红, 司马能, 屠锡富, 布乃敬, 严琼林, 吴鑫. 氧化硅/氧化铁复合磨粒用于硬盘基片的抛光研究[J]. 摩擦学学报, 2010, 30(3): 268-272.
LEI Hong, SIMa Neng, TU Xi-fu, BU Nai-jing, YAN Qiong-lin, WU Xin. CMP of Hard Disk Substrate with SiO2/Fe2O3 Abrasive[J]. TRIBOLOGY, 2010, 30(3): 268-272.
Citation: LEI Hong, SIMa Neng, TU Xi-fu, BU Nai-jing, YAN Qiong-lin, WU Xin. CMP of Hard Disk Substrate with SiO2/Fe2O3 Abrasive[J]. TRIBOLOGY, 2010, 30(3): 268-272.

氧化硅/氧化铁复合磨粒用于硬盘基片的抛光研究

CMP of Hard Disk Substrate with SiO2/Fe2O3 Abrasive

  • 摘要: 本文以HNO3、NaOH、Fe(NO3)3和SiO2浆料为原料,采用沉淀法制备了1种SiO2/Fe2O3复合磨粒,通过X射线衍射仪(XRD)、飞行时间二次离子质谱仪(TOF-SIMS)和扫描电子显微镜(SEM)对其结构进行表征,结果表明Fe2O3包覆到SiO2的表面,复合粒子具有很好的分散性。用UNIPOL-1502抛光机研究了所制备复合磨粒在镍磷敷镀的硬盘基片中的抛光性能,抛光后硬盘基片的表面粗糙度Ra由抛光前的8.87 nm降至3.73 nm;抛光后表面形貌的显微镜观测结果表明新制备的复合磨粒表现出较好的抛光性能。

     

    Abstract: A kind of novel silicon /ferric oxide core-shell abrasive was synthesized using HNO3, NaOH, Fe(NO3)3 and SiO2 by chemical co-precipitation, and its structure and dispersibility were characterized by X-ray diffraction (XRD), time-of-flight secondary ion mass spectroscopy (TOF-SIMS) and scanning electron microscope (SEM). The results showed that Fe2O3 were successfully coated on the surface of SiO2 particles, and the composite abrasive has good dispersibility. The CMP performances of the SiO2/Fe2O3 composite abrasive on hard disk substrate were investigated by UNIPOL-1502 CMP equipment. The average roughness of surface can be reduced from 8.87 nm to 3.73 nm after polishing for 7 minutes. Microscope images of polished surfaces indicated that the slurry containing SiO2/Fe2O3 composite abrasive exhibited improved CMP performances.

     

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