ISSN   1004-0595

CN  62-1095/O4

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刘晓红, 卢小伟, 何乃如, 吉利, 李红轩, 周惠娣, 陈建敏. 退火温度对氧化铬薄膜结构和高温摩擦学性能的影响[J]. 摩擦学学报, 2019, 39(2): 164-170. DOI: 10.16078/j.tribology.2018178
引用本文: 刘晓红, 卢小伟, 何乃如, 吉利, 李红轩, 周惠娣, 陈建敏. 退火温度对氧化铬薄膜结构和高温摩擦学性能的影响[J]. 摩擦学学报, 2019, 39(2): 164-170. DOI: 10.16078/j.tribology.2018178
LIU Xiaohong, LU Xiaowei, HE Nairu, JI Li, LI Hongxuan, ZHOU Huidi, CHEN Jianmin. Influence of Annealing Temperature on Structure and High Temperature Tribological Properties of Chromium oxide Films[J]. TRIBOLOGY, 2019, 39(2): 164-170. DOI: 10.16078/j.tribology.2018178
Citation: LIU Xiaohong, LU Xiaowei, HE Nairu, JI Li, LI Hongxuan, ZHOU Huidi, CHEN Jianmin. Influence of Annealing Temperature on Structure and High Temperature Tribological Properties of Chromium oxide Films[J]. TRIBOLOGY, 2019, 39(2): 164-170. DOI: 10.16078/j.tribology.2018178

退火温度对氧化铬薄膜结构和高温摩擦学性能的影响

Influence of Annealing Temperature on Structure and High Temperature Tribological Properties of Chromium oxide Films

  • 摘要: 采用电弧离子镀技术在GH-4169高温合金基体上沉积氧化铬薄膜,并对薄膜进行了不同温度的退火处理,系统研究了不同退火温度(500、600、700和800 ℃)对薄膜形貌、薄膜结构、薄膜力学性能及薄膜摩擦学性能的影响. 结果表明:随退火温度升高,薄膜表面缺陷减少,氧化铬晶化趋于完善,薄膜硬度下降. 高温摩擦学性能方面薄膜经500和600 ℃退火后,在环境温度从室温到800 ℃宽温域范围内摩擦系数较退火前均有所增加;经800 ℃退火后的薄膜在环境温度为400~600 ℃时的摩擦系数均明显下降,但室温摩擦系数明显升高,宽温域内摩擦系数波动较大;700 ℃退火后薄膜宽温域内摩擦系数在0.21~0.33之间,波动较小.

     

    Abstract: Chromium oxide thin film was deposited on GH-4169 alloy by arc ion plating (AIP). The effects of annealing temperature (500 ℃, 600 ℃, 700 ℃ and 800 ℃) on morphology, structure, mechanical properties and tribological properties were studied . The results showed that the chromium oxide film presented a decreasing defect density and hardness, and gradually perfect crystallinity, as the annealing temperature increased. In addition, chromium oxide films annealing at different temperatures presented different high temperature tribological properties: chromium oxide films annealing at 500 ℃ and 600 ℃ showed a higher friction coefficient than one as-deposited from 25 ℃ to 800 ℃; chromium oxide films annealing at 800 ℃ showed a relatively low friction coefficient from 400 ℃ to 600 ℃, while a high friction coefficient (>0.4) at room temperature, which indicated a obvious fluctuation over a wide range of temperature; chromium oxide films annealing at 700 ℃ showed a stable friction coefficient (0.21~0.33) from 25 ℃ to 800 ℃.

     

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