ISSN   1004-0595

CN  62-1095/O4

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离子束增强沉积和磁控溅射硫化钼薄膜的摩擦磨损性能研究[J]. 摩擦学学报, 1995, 15(4): 341-347.
引用本文: 离子束增强沉积和磁控溅射硫化钼薄膜的摩擦磨损性能研究[J]. 摩擦学学报, 1995, 15(4): 341-347.
A Study on the Friction and Wear Performances of MoSx Thin Films Produced by lon Beam Enhanced Deposition and Magnetron Sputtering[J]. TRIBOLOGY, 1995, 15(4): 341-347.
Citation: A Study on the Friction and Wear Performances of MoSx Thin Films Produced by lon Beam Enhanced Deposition and Magnetron Sputtering[J]. TRIBOLOGY, 1995, 15(4): 341-347.

离子束增强沉积和磁控溅射硫化钼薄膜的摩擦磨损性能研究

A Study on the Friction and Wear Performances of MoSx Thin Films Produced by lon Beam Enhanced Deposition and Magnetron Sputtering

  • 摘要: 在离子束增强沉积的Si3N4膜和TiN膜的表面,分别利用离子增强沉积法和磁控溅射法制取了MoSx薄膜。在SRV摩擦磨损试验机上,对几种薄膜试样与52100钢板样作了对比试验研究。结果表明,两种MoSx薄膜都具有良好的摩擦磨损性能。

     

    Abstract: MoSx thin films were deposited by IBED and magnetron sputtering(MS)methodson the surface of IBED Si3N4 and TiN thin films.The friction and wear performances of thinfilms and 5 2 1 00 steel were compared by a SRV testing machine.The results showed that allMoSx films exhibit good tribological behavior.The MS MoSx thin film is better in wear-resis-tance and the IBED MoSx film shows a longer wear life. The wear resistance of IBED Si3N4and TiN film plus MoSx films is 3-4 times and 8- 20 times that of single IBED Si3N4 and TiNfilms and 52100 steel respectively.The analyses indicated that the difference of friction andwear performance between two kinds of MoSx thin films is determined by x values of MoSx,its microstructure and atom mixing state at interface.

     

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