ISSN   1004-0595

CN  62-1224/O4

高级检索
物理气相沉积减摩与耐磨薄膜[J]. 摩擦学学报, 1996, 16(3): 282-288.
引用本文: 物理气相沉积减摩与耐磨薄膜[J]. 摩擦学学报, 1996, 16(3): 282-288.
Physical Vapour Deposited Films for Lubrication and Wear Resistance[J]. TRIBOLOGY, 1996, 16(3): 282-288.
Citation: Physical Vapour Deposited Films for Lubrication and Wear Resistance[J]. TRIBOLOGY, 1996, 16(3): 282-288.

物理气相沉积减摩与耐磨薄膜

Physical Vapour Deposited Films for Lubrication and Wear Resistance

  • 摘要: 在摩擦学研究的基础上,综合评述与探讨了物理气相沉积薄膜摩擦和磨损的机械-化学作用机理;根据这种机理分析讨论了对物理气相沉积润滑和耐磨薄膜的基本要求,提出了实现这些要求的物理气相沉积的技术基础。

     

    Abstract: A mechanical chemical mechanism of friction and wear was primarily studied based on the fundamental results from tribology research;Some essential requirements for physical vapour deposited(PVD) lubricating and wear resistant thin solid films were discussed depending on this mechanism; Basic technology for PVD to reach these requirements was discussed.

     

/

返回文章
返回